第22卷第7期 2014年7月
文章编号
1004-924X(2014)07-1814-06
光学精密工程
Optics and Precision Engineering
绝对式光栅尺母尺刻划曝光系统
Vol.22No.7
Jul.2014
刘华1，卢振武1，熊1,2，王尧"，王鹤"，黄剑波"，谭向全1，孙强（1.中国科学院长春光学精密机械与物理研究所光电技术研发中心，吉林长春130033；
2.中国科学院大学，北京130049）
摘要：提出了基于数字微镜器件（DMD)的双赚光头总体结构，该结构可同时刻划母尺的周期和非周期两个光幅码道。单曝光头包含曝光光源、调焦光源、DMD和投影镜头四部分，噪光光源由激光器、准直镜组、二维微透镜阵列和场镜组成。本文利用光学软件TracePro设计该光源，实现了能量的平预分布，在14mm×10mm的照明面上均匀性达到95% 以上。利用光学软件Zemax设计了工作在双波段（曝光光源0,403～0.407μm和调焦光源0.525~0.535μm)的共焦投影镜头，采用了二向色镜和分光校镜使其能在眼光的同时进行实时调焦，优化后的系统在噪光波段和调焦波段均达到衍射极限，最大畸变为0.009%。与传统的光栅尺刻划技术对比，设计的曝光系统具有工艺简单、制作速度快、精度高等优势，可用于长、超长计量光栅的制作。
关键调：绝对式光尺；光栅码道；母尺刻划；数字微镜器件；眼光头；计量光橱
中图分类号：TN305,7
文献标识码：A
doi:10. 3788/OPE. 20142207. 1814
Exposureopticalsysteminlithographicmain
scaleofabsoluteoptical encoder
LIU Hua',LU Zhen-wu',XIONG Zheng-2,WANG Yao',WANG He',
HUANG Jian-bo',TAN Xiang-quan',SUN Qiang
(1.Optoelectronics Technology Center,Changchun Institute of Optics,FineMechanics and Physics,
ChineseAcademy of Sciences,Changchun130033,China;
2.Uniersity of Chinese Academy of Sciences,Beijing 130049,China)
+Correspondingauthor,E-mail:girlliuhua@sohu.com
Abstract: A general structure for two photolithographic heads based on Digital Micro-mirror Devices(DMDs) is proposed for simultaneously lithography of the double-track codes of an absolute optical encoder. The total optical system includes an exposure light source, an focusing light source, a DMD and a projective lens.The exposure light source mainly consists of a laser, a collimation lens, a 2D micro-mirror array and a field lens, The exposure light source is designed by TracePro software, and the uniformity of the energy distribution is above 95% in the area of 14 mmX 10 mm. A confocal projective system at two wavebands (exposure source at 0. 403 -0. 407μm and focusing source at 0. 525-0. 535 μm) is designed by Zemax software, in which the exposure and focusing can be realized in real time with a dichroscope and a prism. The imaging quality of the projective lens reaches
收稿日期：2013-11-12；修订日期：2013-12-08.
基金项目：国家科技重大专项资助项目（No.2013ZX04007021)