第19卷
第8期
2011年8月
文章编号
1004-924X(2011)081810-06
光学精密工程
Optics and Precision Engineering
球面旋涂光刻胶工艺
刘小涵1，2*，冯晓国1，赵晶丽1，高劲松"，张红胜1，程志峰
Vol. 19No.8
Aug.2011
（1.中国科学院长春光学精密机械与物理研究所中国科学院光学系统先进制造技术重点实验室，
吉林长春130033；2.中国科学院研究生院，北京100039）
摘要：研究了离心式涂胶工艺理论以实现在凹球面内表面涂布厚度均匀的光刻胶。首先，讨论了影响膜厚均匀性的主要因素；接着，用流体力学理论分析了离心式开口向下球面涂胶过程中胶液的受力流动状态，建立了出胶膜厚度与离心机转速、胶液粘度、旋涂时间等参数关系的数学模型；最后，为了验证理论的正确性，在口径g120mm，固球面半径300mm，失高12.5mm的K9玻璃试验件内表面开展涂胶工艺实验。测试分析结果表明，该理论分析模型与实际情况相符，根据理论分析采用主轴与工件旋转轴偏心的装夹方法，在整个球面内表面可以得到厚度均匀的胶膜。当光刻胶黏度为1.1
~1.9Pa，主轴转速为3000～6000r/min时，可在凹球面上涂布厚度为0.5～1μm的均匀胶膜。关键调：光刻胶；高心式涂胶；流体力学；胶膜厚度；胶液粘度；转速：
中图分类号：TN305.7
文献标识码：A
doi;10.3788/OPE,20111908.1810
Processof sphericalphotoresistspincoating
LIU Xiao-han'-2', FENG Xiao-guo', ZHAO Jing-li', GAO Jin-song',ZHANG Hong-sheng',CHENG Zhi-fengl.s
(l.KeyLaboratoryof Optical SystemAduancedManufacturingTechnology
ChangchunInstituteof Optics,FineMechanicsand Physics, ChineseAcademy ofSciences,Changchun130033,China;
2.GraduateUniversityofChineseAcademy ofSciences,Beijing100039,China)
Correspondingauthor,E-mail:liuriaohanciompsohu.com
Abstract: A centrifugal coating technology was researched to coating the uniform thickness photoresist On a concave spherical surface. Firstly, the critical factors affecting the uniform of photosensitive re sist and the film forming force were investigated. Then, the centrifugal glue adhesive force during the flow state was analysed in the spherical photoresist spin coating down opening based on the hydrody-namic theory. A mathematical model to describe the relationship among the film thickness and centri-fuge speed, viscosity of photoresist and the spin coating time was derived. Finally, in order to verify the correctness of the formula , some experiments of photoresist spin coating on the K9 glass concave sphere with a diameter of 120 mm, radius of 300 mm, vector height of 12.5 mm were performed. The experimental results certify that the proposed theory is consistent with the actual situation well, On
收稿日期：2010-12-02；修订日期：2010-12-17，
基金项目：国防科技预研基金资助项目（No.10.4.2.ZK1001）