第25卷
第7期
2017年7月文章编号
1004-924X(2017)07-1764-07
光学精密工程
Optics and Precision Engineering
大尺寸光学元件在位动态于涉
拼接测量系统于瀛洁*，齐特，武欣
（上海大学机电工程及自动化学院，上海200072）
Vol. 25No.7
Jul.2017
摘要：为了满足车间条件下大口径光学元件的高精度在位、在线检测的迫切需求，本文构建了一个适于一般环境下应用的动态干涉拼接测量实验系统。该系统由动态干涉仪、二维移动平台、控制系统及拼接软件等部分构成。应用该系统对 200mm×300mm×20mm的光学元件在一般应用环境下进行了拼接测量实验，采用误差均化拼接算法进行拼接，并对拼接后的结果进行分析处理，比较拼接测量与全口径测量结果，PV值的相对误差为3.1%，RMS值的相对误差为
1.6%，Power值的相对误差为2.1%。该系统为在车间环境下建立大口径光学元件在位检测建立了基础，关键词：光学检测；子孔径拼接；动态干涉仅；大口径光学元件；误差均化拼接
中图分类号：TH74;TH703
文献标识码：A
doi:10.3788/OPE.20172507.1764
On-line dynamic interference stitching measurement system
forlargeopticalelements YUYing-jie',QI Te,WU Xin
(Departmentof PrecisionMechanical Engineering,Shanghai University,
Shanghai200072,China)
*Correspondingauthor，E-mail:yingjieyu@staff.shu.edu.cn
Abstract: In order to realize on-line and in-situ measurement of high precision optical elements in workshop, a dynamic interference stitching system for large optical elements measured in general environment was investigated. The system was consisted of a dynamic interferometer, two dimensional mobile platform, control system and stitching software. A stitching experiment for an 200 mmX 300 mm optical element was completed by this system in general environment, based on error averaging stitching algorithm. Moreover, the stitching results were analyzed. Comparing the results between stitching measurement and full aperture measurement, the relative deviations of PV, RMS and Power are 3. 1%, 1. 6% and 2. 1% respectively. The system lays a foundation for the on-line and in-situ measurement system for large optical elements in the workshop environment.
收稿日期：2017-01-19；修订日期：2017-03-16
基金项目：国家重大科技专项（No.2013ZX04006011-217)；国家自然科学基金资助项目（No.51175318）